Surface Analysis

SEM and Energy Dispersion Spectroscopy

    SEM/EDS JEOL 6460LV

  • 50-20,000X Mag (5-20kV)
  • Backscatter Detector
  • LV adjustable (10-270 Pa)
  • EDS Oxford
  • Elemental Quantification

X-Ray Photo-Electron Spectroscopy / ESCA

    XPS PHI 5400

  • Mg/Al Anode
  • Elemental and Chemical Analysis (>Li)
  • Ar Sputtering for depth analysis

Confocal Microscope

    Olympus LEXT OSL 4100

  • 3D Imagining (405 nm)
  • Line and Surface Roughness
  • Area/Volume measurements
  • Particle Size Measuurements

Atomic Force Microscope

    Agilent 5420

  • Contact Imaging Surface Morphology/roughness Elastic/Viscoelastic properties
  • Intermittent Contact
  • Non-Contact

Ellipsometer

    Horiba UVISEL

  • 1.5 -5.5 eV (220-800nm)
  • Film Thicknesses monolayer to microns
  • Surface and interracial roughness
  • Optical constants (n.k)